Calibration Wafer Standards,
Cleanroom Smoke Studies,
Airflow Visualization Foggers,
Silica Microspheres,
Polystyrene Microspheres,
Particle Size Standards

PSL Calibration Wafer Standards are produced for calibration of KLA-Tencor, Hitachi, etc. wafer inspection machines, referred to as SSIS tools. Polystyrene microspheres are deposited from 30 nm up to 15 µm on the surface of 300mm, 200mm, 150mm, 125mm, 100mm and 75mm wafers; as well as customer quartz masks and customer film deposited wafers. These standards are referred to by Metrology Engineers as Particle Size Standards, Wafer Standards, PSL Wafer Standards and Wafer Calibration Standards, etc. Particle Size Standards are deposited on prime silica wafer substrates, customer’s film deposited wafers and customer’s mask substates and used to calibrate the size accuracy and size response of your Tencor, KLA, KLA-Tencor, Hitachi, TopCon, Applied Materials, Tokyo Electron wafer inspection systems and SSIS scanning systems. Circle Depositions called SPOT Depositions on a single wafer standard is provided, as well as Full Depositions or Half Depositions on single or multiple wafers.

Our 300mm Prime Silica substrates are typically clean down to 18nm, while 200mm prime silica substrates are typically surface cleaned to about 80nm. Our 300mm and 200mm silica wafers start out quite clean, allowing for a number of particle size depositions on a single wafer. Multiple particle depositions, Circle and SPOT Depositions, on a single wafer have the advantage of enabling your wafer inspection system, commonly called a scanning surface inspection system or SSIS, to be verified for calibration accuracy across a broad range of sizes during a single wafer scan. On the other hand, FULL Deposition wafer standards provide a single particle size calibration during a wafer scan, while allowing the Metrology Engineer to observe how uniform the particle detection is across the entire surface of a uniformly deposited, Full Deposition Wafer Standard.

Our Smoke Studies Foggers, also referred to as smoke generators and smoke machines, are used in Pharmaceutical and Semiconductor clean rooms and ISO suites to verify airflow uniformity in the clean room, around equipment and from ISO Suite to ISO Suite. Smoke Studies and Airflow Visualization Studies are mandated in the Semiconductor industry using USP797 guideline, SEMI Standards guidelines or ISO guidelines. The pharmaceutical industry is controlled by USP 797 and FDA guidelines in most smoke studies. We provide ultrasonic foggers and LN2 Foggers for Smoke Studies, using 80mm fog outlet or 80mm dual fog outlets, combined with fog velocity control and fog volume control with controlled fog output to visualize airflow turbulence and dead airflow zones in cleanrooms, bio-safety cabinets, airflow hoods, barrier isolators, etc.

Our stainless steel foggers are designed with brushed stainless steel, 80mm fog outlets, fog velocity and fog volume control; and also has optional wireless remote control along with 11 different fog attachment accessories for smoke studies in clean rooms, ISO suites, sterile rooms, Barrier Isolators, etc. Our  Apollo 35, Apollo 50, Apollo 100 and Apollo 150 use liquid nitrogen and pure water (De-Ionized, WFI or Sterile) to produce a very dense, ultrapure, adjustable fog volume providing a superb airflow visualization with a paper-white fog. The technology of the nitrogen foggers is unmatched by any other fog generating technology used in clean rooms, ISO Suites, Sterile Rooms, Barrier Isolators, etc. Liquid Nitrogen foggers produce far more fog than ultrasonic transducers, CO2 (dry ice) or glycol fluid/hot wire technology. The Apollo 35 and Apollo 50 nitrogen-di-water fog machines are our standard LN2 foggers with 1 80mm fog outlet, while the Apollo 100 has two 80mm fog outlets and Apollo 150 has three 80mm fog outlets to reduce the amount of time needed to conduct a complete smoke study. Our nitrogen foggers are used for contamination free, smoke studies, air flow visualization and mapping studies in clean rooms, sterile rooms, medical surgery rooms, ISO suites, etc., according to ISO 14644-3 annex b7, or ISO 14644-2 guidelines.

Particle Size Standards are highly accurate size standards typically used to calibrate aerosol particle counters for size accuracy. Polystyrene microspheres are available from 20 nm to 1000 µm; while our Silica micro-spheres are provided from 30 nm to 1 µm (1000nm). Both types of particle size standards are used in aerosol research, particle counter size calibration and Pharmaceutical drug delivery. Silica micro-spheres are especially beneficial in Semiconductor CMP Slurry to provide the surface polish of 300 mm and 200 mm silicon wafers.